Optical non-contact micrometer thickness measurement system for silica thick films

Kishan Thambiratnam and Harith Ahmad and Moh. Yasin and Ahmad Zarif Zulkifli and Sulaiman Wadi Harun (2012) Optical non-contact micrometer thickness measurement system for silica thick films. In: UNSPECIFIED.

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Abstract

In this paper, a novel optical approach is proposed and demonstrated for the non-contact measurement for the thickness of silica thick films. This approach is based on the principal of an optical based displacement sensor. The calibration curve for the measurement of the thickness of an unknown sample is obtained using four sample with known thicknesses of 6.90, 10.23, 19.69 and 25.47 μm respectively. As compared to a prism coupler, which is assumed to provide the most precise measurement of thick film thicknesses, the proposed system has an error of approximately 8. The proposed method is able to provide a simple, low cost and time saving approach in measuring thick films thicknesses during fabrication. © 2012 SPIE.

Item Type: Conference or Workshop Item (UNSPECIFIED)
Additional Information: cited By 1; Conference of Reflection, Scattering, and Diffraction from Surfaces III ; Conference Date: 13 August 2012 Through 16 August 2012; Conference Code:94985
Uncontrolled Keywords: Displacement sensor; Intensity-based; Micro-thickness; Planar waveguide circuit; Translation stage, Diffraction; Fiber optics; Sensors; Silica; Surface scattering; Thickness measurement, Thick films
Divisions: Artikel Ilmiah > SCOPUS INDEXED JOURNAL
Creators:
CreatorsNIM
Kishan ThambiratnamUNSPECIFIED
Harith AhmadUNSPECIFIED
Moh. YasinUNSPECIFIED
Ahmad Zarif ZulkifliUNSPECIFIED
Sulaiman Wadi HarunUNSPECIFIED
Depositing User: Ika Rudianto
Last Modified: 31 Dec 2020 14:24
URI: http://repository.unair.ac.id/id/eprint/102440
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