Alfa Akustia Widati*, .- and Mochamad Zakki Fahmi, .- and Satya Candra Wibawa Sakti, .- and Titah Aldila Budiastanti, .- and Tri Esti Purbaningtias., .- (2022) Hydrophobic Material: Effect of Alkyl Chain Length on the Surface Roughness. Journal of Manufacturing and Materials Processing, 6 (5). ISSN 2352-1864
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Abstract
The clean technologies of self-cleaning surfaces are expanding rapidly. Highly hydrophobic coatings with strong adhesion, high durability, and dirt-free surfaces have been prepared via sol-gel deposition of SiO2-TiO2-alkylsilane. The influence of the effects of the alkyl chain length of silane on surface roughness was investigated. This deposition involved a one-layer technique to produce the rough surfaces. The bimetal oxide of SiO2-TiO2 created a high level of surface roughness. As a result, the water contact angle of the coatings increased with the increasing alkyl chain length of silane (up to C=8). However, the water contact angle decreased when the C=16 of alkylsilane was applied. It was predicted that the longer alkyl chain would cause the molecules to collapse. The higher hydrophobicity was produced by SiO2-TiO2-OTMS coatings with a water contact angle of about 140.67 ± 1.23°. The effect of the dip-coating technique (one layer and layer-by-layer) on hydrophobicity was also discussed. The results showed that coatings produced by the one-layer technique had a higher contact angle than coatings made by the layer-by-layer technique. The coatings were stable under outdoor exposure and able to hinder dirt attachment to their surfaces.
Item Type: | Article | ||||||||||||
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Uncontrolled Keywords: | clean technologies; self-cleaning; hydrophobic; alkyl chain length; SiO2-TiO2-alkylsilane | ||||||||||||
Subjects: | Q Science Q Science > QD Chemistry Q Science > QD Chemistry > QD450-801 Physical and theoretical chemistry |
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Divisions: | 08. Fakultas Sains dan Teknologi > Kimia | ||||||||||||
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Depositing User: | Mr Vega Andi Budiman | ||||||||||||
Date Deposited: | 09 Jun 2023 06:49 | ||||||||||||
Last Modified: | 10 Jun 2023 05:53 | ||||||||||||
URI: | http://repository.unair.ac.id/id/eprint/125923 | ||||||||||||
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